{"id":"https://openalex.org/A5019657501","orcid":null,"observed_orcids":[],"display_name":"Guido Schiffelers","raw_author_names":["G. Schiffelers","Guido Schiffelers","Schiffelers Guido"],"full_name":"Guido Schiffelers","works_count":26,"cited_by_count":378,"summary_stats":{"2yr_mean_citedness":13.75,"h_index":10,"i10_index":10},"ids":{"openalex":"https://openalex.org/A5019657501","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I83019370","ror":"https://ror.org/02c2kyt77","display_name":"Eindhoven University of Technology","country_code":"NL","type":"education","lineage":["https://openalex.org/I83019370"]},"years":[2005]},{"institution":{"id":"https://openalex.org/I927257375","ror":"https://ror.org/01vxknj13","display_name":"ASML (Netherlands)","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]},"years":[2025,2024,2020,2019,2018,2016,2015,2014,2013,2008]}],"last_known_institutions":[{"id":"https://openalex.org/I927257375","ror":"https://ror.org/01vxknj13","display_name":"ASML (Netherlands)","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":25,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":19,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","count":17,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","count":5,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","count":3,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0002314,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","value":0.0001281,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":8.02e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","value":2.99e-05,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","value":2.32e-05,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","score":0.9899595975875854},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.7673057317733765},{"id":"120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","score":0.7633123397827148},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.7044673562049866},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.5192987322807312}],"counts_by_year":[{"year":2005,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2008,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2013,"works_count":2,"oa_works_count":0,"cited_by_count":3},{"year":2014,"works_count":5,"oa_works_count":0,"cited_by_count":46},{"year":2015,"works_count":1,"oa_works_count":0,"cited_by_count":29},{"year":2016,"works_count":1,"oa_works_count":0,"cited_by_count":29},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":30},{"year":2018,"works_count":5,"oa_works_count":0,"cited_by_count":19},{"year":2019,"works_count":4,"oa_works_count":0,"cited_by_count":23},{"year":2020,"works_count":1,"oa_works_count":1,"cited_by_count":10},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":19},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":22},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":19},{"year":2024,"works_count":2,"oa_works_count":0,"cited_by_count":31},{"year":2025,"works_count":2,"oa_works_count":0,"cited_by_count":47},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":39}],"display_name_alternatives":["G. Schiffelers","Guido Schiffelers","Schiffelers Guido"],"block_key":"g schiffelers","works_api_url":"https://api.openalex.org/works?filter=author.id:A5019657501","updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}