{"id":"https://openalex.org/A5018968140","orcid":null,"observed_orcids":[],"display_name":"Benjamin Dumont","raw_author_names":["B Dumont","B. Dumont","Benjamin Dumont"],"full_name":"Benjamin Dumont","works_count":25,"cited_by_count":792,"summary_stats":{"2yr_mean_citedness":1.0,"h_index":7,"i10_index":6},"ids":{"openalex":"https://openalex.org/A5018968140","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I4210104693","ror":"https://ror.org/01c74sd89","display_name":"STMicroelectronics (France)","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]},"years":[2024,2021,2020,2015,2013,2012,2010,2009,2008,2007,2006,2005,2004]},{"institution":{"id":"https://openalex.org/I48430043","ror":"https://ror.org/050jn9y42","display_name":"Institut National des Sciences Appliqu\u00e9es de Lyon","country_code":"FR","type":"education","lineage":["https://openalex.org/I203339264","https://openalex.org/I48430043"]},"years":[2006]}],"last_known_institutions":[{"id":"https://openalex.org/I4210104693","ror":"https://ror.org/01c74sd89","display_name":"STMicroelectronics (France)","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":23,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","count":20,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","count":10,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","count":8,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":2,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","value":7.41e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","value":4.77e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12495","display_name":"Electrostatic Discharge in Electronics","value":4.58e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","value":2.83e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","value":2.82e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.8937461972236633},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.7178035974502563},{"id":"119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","score":0.5237486362457275},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.4700770676136017},{"id":"127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","score":0.3239753246307373}],"counts_by_year":[{"year":2004,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2007,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":2,"oa_works_count":0,"cited_by_count":24},{"year":2013,"works_count":2,"oa_works_count":0,"cited_by_count":43},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":62},{"year":2015,"works_count":1,"oa_works_count":0,"cited_by_count":68},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":85},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":56},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":57},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":50},{"year":2020,"works_count":1,"oa_works_count":0,"cited_by_count":29},{"year":2021,"works_count":1,"oa_works_count":0,"cited_by_count":54},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":50},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":34},{"year":2024,"works_count":1,"oa_works_count":0,"cited_by_count":32},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":33},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":18}],"display_name_alternatives":["B Dumont","B. Dumont","Benjamin Dumont"],"block_key":"b dumont","works_api_url":"https://api.openalex.org/works?filter=author.id:A5018968140","awards_count":0,"updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}