{"id":"https://openalex.org/A5017553019","orcid":null,"observed_orcids":[],"display_name":"Andre van Dijk","raw_author_names":["A. Van Dijk","A. van Dijk","Andre Van Dijk","Andre van Dijk"],"full_name":"Van Dijk, Andre","works_count":14,"cited_by_count":176,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":8,"i10_index":6},"ids":{"openalex":"https://openalex.org/A5017553019","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I4210092175","ror":"https://ror.org/00gtpjy03","display_name":"ASML (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I4210092175","https://openalex.org/I4210092504","https://openalex.org/I927257375"]},"years":[2008]},{"institution":{"id":"https://openalex.org/I4210132699","ror":"https://ror.org/03ajjdx52","display_name":"ASM International (Belgium)","country_code":"BE","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I4210132699"]},"years":[2023,2017]},{"institution":{"id":"https://openalex.org/I927257375","ror":"https://ror.org/01vxknj13","display_name":"ASML (Netherlands)","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]},"years":[2020,2015,2011,2009,2008]}],"last_known_institutions":null,"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":14,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","count":12,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":10,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","count":2,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10363","display_name":"Low-power high-performance VLSI design","count":1,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0001298,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","value":9.05e-05,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":4.22e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11992","display_name":"CCD and CMOS Imaging Sensors","value":1.15e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":1.06e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","score":0.9924547672271729},{"id":"204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","score":0.7883028984069824},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.7044673562049866},{"id":"41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","score":0.5848154425621033},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.47497981786727905}],"counts_by_year":[{"year":2008,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2009,"works_count":4,"oa_works_count":1,"cited_by_count":0},{"year":2011,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":14},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":9},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":7},{"year":2015,"works_count":1,"oa_works_count":0,"cited_by_count":9},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2017,"works_count":1,"oa_works_count":0,"cited_by_count":3},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2020,"works_count":1,"oa_works_count":0,"cited_by_count":1},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2023,"works_count":1,"oa_works_count":0,"cited_by_count":4},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":9},{"year":2025,"works_count":1,"oa_works_count":0,"cited_by_count":3},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":5}],"display_name_alternatives":["A. Van Dijk","A. van Dijk","Andre Van Dijk","Andre van Dijk"],"block_key":"a dijk","works_api_url":"https://api.openalex.org/works?filter=author.id:A5017553019","updated_date":"2026-11-04T11:47:51","created_date":"2016-06-24T00:00:00"}