{"id":"https://openalex.org/A5017232007","orcid":null,"observed_orcids":[],"display_name":"Matthias Cumme","raw_author_names":["M. Cumme","Matthias Cumme"],"full_name":"Matthias Cumme","works_count":22,"cited_by_count":62,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":5,"i10_index":2},"ids":{"openalex":"https://openalex.org/A5017232007","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I1302207122","ror":"https://ror.org/02mp31p96","display_name":"Carl Zeiss (Germany)","country_code":"DE","type":"company","lineage":["https://openalex.org/I1302207122"]},"years":[2015]},{"institution":{"id":"https://openalex.org/I4210165433","ror":"https://ror.org/05g7t5c49","display_name":"Jenoptik (Germany)","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210165433"]},"years":[2008,2007,2005]},{"institution":{"id":"https://openalex.org/I76198965","ror":"https://ror.org/05qpz1x62","display_name":"Friedrich Schiller University Jena","country_code":"DE","type":"education","lineage":["https://openalex.org/I76198965"]},"years":[2005,2003,2002,2001,2000,1999]}],"last_known_institutions":null,"topics":[{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":19,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":10,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","count":8,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","count":6,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10245","display_name":"Metamaterials and Metasurfaces Applications","count":3,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":9.26e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":8.03e-05,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","value":6.85e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":2.13e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","value":1.96e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","score":0.8000830411911011},{"id":"136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","score":0.7996670007705688},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.7591617703437805},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.5357211232185364},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.5063604116439819}],"counts_by_year":[{"year":1999,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2000,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2001,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2007,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":1},{"year":2015,"works_count":2,"oa_works_count":0,"cited_by_count":1},{"year":2017,"works_count":1,"oa_works_count":1,"cited_by_count":2},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":3},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":2}],"display_name_alternatives":["M. Cumme","Matthias Cumme"],"block_key":"m cumme","works_api_url":"https://api.openalex.org/works?filter=author.id:A5017232007","updated_date":"2026-11-07T12:08:38","created_date":"2016-06-24T00:00:00"}