{"id":"https://openalex.org/A5002829962","orcid":null,"observed_orcids":[],"display_name":"Benjamen M. Rathsack","raw_author_names":["B. Rathsack","Benjamen M. Rathsack","Benjamen Rathsack"],"full_name":"Benjamen M. Rathsack","works_count":31,"cited_by_count":301,"summary_stats":{"2yr_mean_citedness":0.0,"h_index":12,"i10_index":12},"ids":{"openalex":"https://openalex.org/A5002829962","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I114132059","ror":"https://ror.org/05gd76j39","display_name":"Tokyo Electron (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I114132059"]},"years":[2015,2014,2013,2012,2011,2010]},{"institution":{"id":"https://openalex.org/I4210085935","ror":"https://ror.org/005w8dd04","display_name":"IBM Research - Almaden","country_code":"US","type":"facility","lineage":["https://openalex.org/I1341412227","https://openalex.org/I4210085935","https://openalex.org/I4210114115"]},"years":[2004]},{"institution":{"id":"https://openalex.org/I74760111","ror":"https://ror.org/03vsmv677","display_name":"Texas Instruments (United States)","country_code":"US","type":"company","lineage":["https://openalex.org/I74760111"]},"years":[2006,2004,2003,2002]},{"institution":{"id":"https://openalex.org/I86519309","ror":"https://ror.org/00hj54h04","display_name":"The University of Texas at Austin","country_code":"US","type":"education","lineage":["https://openalex.org/I86519309"]},"years":[2008,2004,2001,2000,1999,1998]}],"last_known_institutions":[{"id":"https://openalex.org/I114132059","ror":"https://ror.org/05gd76j39","display_name":"Tokyo Electron (Japan)","country_code":"JP","type":"company","lineage":["https://openalex.org/I114132059"]}],"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":24,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","count":11,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","count":11,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","count":10,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","count":8,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":0.0002157,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12570","display_name":"Photopolymerization techniques and applications","value":0.000123,"subfield":{"id":"https://openalex.org/subfields/1605","display_name":"Organic Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","value":0.0001021,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11471","display_name":"Block Copolymer Self-Assembly","value":7.62e-05,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","value":4.5e-05,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","score":0.9874825477600098},{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.808991551399231},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.64151930809021},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.4951256811618805},{"id":"121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","score":0.17897075414657593}],"counts_by_year":[{"year":1996,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":1998,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":1999,"works_count":3,"oa_works_count":0,"cited_by_count":0},{"year":2000,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2001,"works_count":4,"oa_works_count":0,"cited_by_count":0},{"year":2002,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2003,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2007,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2011,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":1,"oa_works_count":0,"cited_by_count":7},{"year":2013,"works_count":3,"oa_works_count":1,"cited_by_count":21},{"year":2014,"works_count":2,"oa_works_count":0,"cited_by_count":55},{"year":2015,"works_count":3,"oa_works_count":0,"cited_by_count":41},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":36},{"year":2017,"works_count":0,"oa_works_count":0,"cited_by_count":13},{"year":2018,"works_count":0,"oa_works_count":0,"cited_by_count":20},{"year":2019,"works_count":0,"oa_works_count":0,"cited_by_count":6},{"year":2020,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2021,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2022,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2023,"works_count":0,"oa_works_count":0,"cited_by_count":2},{"year":2024,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2025,"works_count":0,"oa_works_count":0,"cited_by_count":5},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":3}],"display_name_alternatives":["B. Rathsack","Benjamen M. Rathsack","Benjamen Rathsack"],"block_key":"b rathsack","works_api_url":"https://api.openalex.org/works?filter=author.id:A5002829962","updated_date":"2026-10-27T12:30:23","created_date":"2016-06-24T00:00:00"}