{"id":"https://openalex.org/A5000951955","orcid":null,"observed_orcids":[],"display_name":"Karen Dabertrand","raw_author_names":["Dabertrand, K.","K. Dabertrand","Karen Dabertrand"],"full_name":"DABERTRAND, Karen","works_count":33,"cited_by_count":242,"summary_stats":{"2yr_mean_citedness":2.2,"h_index":10,"i10_index":10},"ids":{"openalex":"https://openalex.org/A5000951955","orcid":null,"observed_orcids":[]},"affiliations":[{"institution":{"id":"https://openalex.org/I106785703","ror":"https://ror.org/05sbt2524","display_name":"Institut polytechnique de Grenoble","country_code":"FR","type":"education","lineage":["https://openalex.org/I106785703","https://openalex.org/I899635006"]},"years":[2020]},{"institution":{"id":"https://openalex.org/I1294671590","ror":"https://ror.org/02feahw73","display_name":"Centre National de la Recherche Scientifique","country_code":"FR","type":"government","lineage":["https://openalex.org/I1294671590"]},"years":[2020]},{"institution":{"id":"https://openalex.org/I2738703131","ror":"https://ror.org/00jjx8s55","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},"years":[2020,2008,2006]},{"institution":{"id":"https://openalex.org/I3020098449","ror":"https://ror.org/02mg6n827","display_name":"CEA Grenoble","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I3020098449"]},"years":[2020,2008,2006]},{"institution":{"id":"https://openalex.org/I4210104693","ror":"https://ror.org/01c74sd89","display_name":"STMicroelectronics (France)","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]},"years":[2025,2024,2023,2022,2021,2020,2019,2018,2017,2015,2010,2009,2008,2007,2004,2003]},{"institution":{"id":"https://openalex.org/I4210128684","ror":"https://ror.org/036zswm25","display_name":"Laboratoire des Technologies de la Micro\u00e9lectronique","country_code":"FR","type":"facility","lineage":["https://openalex.org/I1294671590","https://openalex.org/I2738703131","https://openalex.org/I3020098449","https://openalex.org/I4210095849","https://openalex.org/I4210128684","https://openalex.org/I899635006"]},"years":[2009,2007]},{"institution":{"id":"https://openalex.org/I4210139715","ror":"https://ror.org/03taa9n66","display_name":"Institut de Micro\u00e9lectronique, Electromagn\u00e9tisme et Photonique","country_code":"FR","type":"facility","lineage":["https://openalex.org/I106785703","https://openalex.org/I1294671590","https://openalex.org/I4210095849","https://openalex.org/I4210139715","https://openalex.org/I70900168","https://openalex.org/I899635006"]},"years":[2020]},{"institution":{"id":"https://openalex.org/I4210150049","ror":"https://ror.org/04mf0wv34","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]},"years":[2020,2008,2007,2006]},{"institution":{"id":"https://openalex.org/I899635006","ror":"https://ror.org/02rx3b187","display_name":"Universit\u00e9 Grenoble Alpes","country_code":"FR","type":"education","lineage":["https://openalex.org/I899635006"]},"years":[2020]}],"last_known_institutions":[{"id":"https://openalex.org/I4210104693","ror":"https://ror.org/01c74sd89","display_name":"STMicroelectronics (France)","country_code":"FR","type":"company","lineage":["https://openalex.org/I131827901","https://openalex.org/I4210104693"]}],"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","count":26,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","count":17,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","count":14,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","count":6,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","count":5,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"topic_share":[{"id":"https://openalex.org/T11661","display_name":"Copper Interconnects and Reliability","value":0.0001382,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","value":6.54e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","value":5.39e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","value":4.63e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","value":3.44e-05,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"x_concepts":[{"id":"192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","score":0.901647686958313},{"id":"49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","score":0.6012524366378784},{"id":"171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","score":0.41968488693237305},{"id":"185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","score":0.3720632791519165},{"id":"127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","score":0.3117052912712097}],"counts_by_year":[{"year":2003,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2004,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2005,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2006,"works_count":1,"oa_works_count":1,"cited_by_count":0},{"year":2007,"works_count":5,"oa_works_count":0,"cited_by_count":0},{"year":2008,"works_count":2,"oa_works_count":1,"cited_by_count":0},{"year":2009,"works_count":2,"oa_works_count":0,"cited_by_count":0},{"year":2010,"works_count":1,"oa_works_count":0,"cited_by_count":0},{"year":2012,"works_count":0,"oa_works_count":0,"cited_by_count":12},{"year":2013,"works_count":0,"oa_works_count":0,"cited_by_count":4},{"year":2014,"works_count":0,"oa_works_count":0,"cited_by_count":9},{"year":2015,"works_count":1,"oa_works_count":0,"cited_by_count":7},{"year":2016,"works_count":0,"oa_works_count":0,"cited_by_count":8},{"year":2017,"works_count":1,"oa_works_count":1,"cited_by_count":8},{"year":2018,"works_count":1,"oa_works_count":0,"cited_by_count":15},{"year":2019,"works_count":2,"oa_works_count":2,"cited_by_count":9},{"year":2020,"works_count":5,"oa_works_count":3,"cited_by_count":9},{"year":2021,"works_count":1,"oa_works_count":1,"cited_by_count":20},{"year":2022,"works_count":1,"oa_works_count":1,"cited_by_count":15},{"year":2023,"works_count":2,"oa_works_count":2,"cited_by_count":18},{"year":2024,"works_count":3,"oa_works_count":1,"cited_by_count":26},{"year":2025,"works_count":2,"oa_works_count":2,"cited_by_count":10},{"year":2026,"works_count":0,"oa_works_count":0,"cited_by_count":22}],"display_name_alternatives":["Dabertrand, K.","K. Dabertrand","Karen Dabertrand"],"block_key":"k dabertrand","works_api_url":"https://api.openalex.org/works?filter=author.id:A5000951955","awards_count":0,"updated_date":"2026-11-08T12:57:04","created_date":"2016-06-24T00:00:00"}